- Vacuum RF & DC Magnetron Sputtering System (Model: MSS)

Specifications:
·        Steel Chamber Volume: 60 Liters
·        Final Pressure: 10-6 mbar
·        Vacuum System:
                Mechanical & Turbomolecular Pumps
·        Operation:
                Semiautomatic with Electrical Power
                 Water, Pressurized Air and Operator Malfunction Protection
·        Chamber Lid Lifting Mechanism: Pneumatic
Main Accessories:
·        Magnetron Sputtering Cathode; 3" and 2" Targets(as ordered )
·        1KW DC Power Supply
·        600 W RF Power Supply at 13.56 MHz
·        Automatic and Manual Matching Box
·        Computerized Thickness Monitoring for each Cathode
·        Manual Sample Holder
·        Station Shutter with Manual Control
·        Sample Shutter with Manual Control
·        Local Plasma Cleaning Cathode