- Magnetron Sputtering Cathode

Specifications
              ·        1000 Watts Power
              ·        2" & 3" Target
               ·        Circular Planar                              Magnetron
              ·        for RF & DC                                 Sputtering
The Magnetron Sputtering Cathode has been optimized and upgraded by means of finite element method using commercial code “ANSYS”. By this optimization, we have achieved 56% for target utilization and 16 nm/s of deposition rate, as the most important parameters, for 3 Inches Magnetron Sputtering Cathode.

This Magnetron Sputtering Cathode is easy installation both for DC & RF Regimes.